Abstract:This work presents a novel process to form SiNx films and process for membranes with excellent mechanical properties for micro-electro-mechanical systems application as well as integration as IR waveguide for photonic application. The SiNx films were fabricated in SiNgen apparatus which is a single wafer chamber equipment compared to conventional low pressure chemical vapor deposition furnace process. The films showed low stress, good mechanical properties, but the synthesis also eradicates the issues of particle contamination. Through optimizing of the growth parameters and post annealing profile, low stress (40 Mpa) SiNx film could be finally deposited when annealing temperature rose up to 1150 °C. The stress relaxation is a result of more Si nano-crystalline which was formed during annealing, according to the FTIR results. The mechanical properties, Young’s modulus and hardness, were 210 Gpa and 20 Gpa respectively. For the waveguide application, a stack of three layers, SiO2/SiNx/SiO2 was formed where the optimized layer thicknesses were used for minimum optical loss according to simulation feedback. After deposition of the first two layers in the stack, the samples were annealed in range of 900–1150 °C in order to release the stress. Chemical mechanical polish technique was applied to planarize the nitride layer prior to the oxide cladding layer. Such wafers can be used to bond to Si or Ge to manufacture advanced substrates.

Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices

Monolithic Integration of a Lithium Niobate Microresonator with a Free-Standing Waveguide Using Femtosecond Laser Assisted Ion Beam Writing.

Monolithic Integration of a High-Quality Factor Lithium Niobate Microresonator with a Free-Standing Membrane Waveguide Using Femtosecond Laser Assisted Ion Beam Writing (FLAIBW)

Fabrication of Silicon Nitride Membrane Nanoelectromechanical Resonator

Control of Recoil Losses in Nanomechanical SiN Membrane Resonators

Optomechanical characterization of silicon nitride membrane arrays

Mechanical investigations of free-standing SiN membranes patterned with one-dimensional photonic crystal structures

High Q-Factor Silicon Nitride Nanomechanical Resonators Fabricated by Maskless Femtosecond Laser Micro-machining

Long-range optomechanical interactions in SiN membrane arrays

Silicon Nitride MOMS Oscillator for Room Temperature Quantum Optomechanics

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Nanomechanical spectroscopy of ultrathin silicon nitride suspended membranes

Photonic Damascene Process for Integrated High-Q Microresonator Based Nonlinear Photonics

Optical probing of mechanical loss of a Si_{3}N_{4} membrane below 100 mK

Direct laser-written optomechanical membranes in fiber Fabry-Perot cavities

Post-CMOS Processing for High-Aspect-ratio Integrated Silicon Microstructures

UV-Nanoimprint and Deep Reactive Ion Etching of High Efficiency Silicon Metalenses: High Throughput at Low Cost with Excellent Resolution and Repeatability

Optimization of Etching Processes for the Fabrication of Smooth Silicon Carbide Membranes for Applications in Quantum Technology

Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching

Fabricating Processes of Free-Standing Silicon Nitride Thin Film for MEMS Devices

SiNx Films and Membranes for Photonic and MEMS Applications