Abstract:On-demand switchable "additive/subtractive" patterning of two-dimensional (2D) nanomaterials is an essential capability for developing new concepts of functional nanomaterials and their device realizations. Traditionally, this is performed via a multistep process using photoresist coating and patterning by conventional photo or electron beam lithography, which is followed by bulk dry/wet etching or deposition. This limits the range of functionalities and structural topologies that can be achieved as well as increases the complexity, cost, and possibility of contamination, which are significant barriers to device fabrication from highly sensitive 2D materials. Focused electron beam-induced processing (FEBIP) enables a material chemistry/site-specific, high-resolution multimode atomic scale processing and provides unprecedented opportunities for "direct-write", single-step surface patterning of 2D nanomaterials with an in situ imaging capability. It allows for realizing a rapid multiscale/multimode approach, ranging from an atomic scale manipulation (e.g., via targeted defect introduction as an active site) to a large-area surface modification on nano- and microscales, including patterned doping and material removal/deposition with 2D (in-plane)/three-dimensional (3D) (out-of-plane) control. In this work, we report on a new capability of FEBIP for nanoscale patterning of graphene oxide via removal of oxygenated carbon moieties with no use of reactive gas required for etching complemented by carbon atom deposition using a focused electron beam. The mechanism of experimentally observed phenomena is explored using the density functional theory (DFT) calculations, revealing that interactions of e-beam that liberated reactive oxygen radicals with carbon atoms on the graphene basal plane lead to the creation of atomic vacancies in the material. The reaction byproducts are volatile carbon dioxides, which are dissociated and volatilized from the graphene oxide surface functional groups by interactions with an energetic focused electron beam. Along with selective subtractive patterning of graphene oxide, the same electron beam with increased irradiation doses can deposit out-of-plane 3D carbon nanostructures on top of or around the 2D etched pattern, thus forming a hybrid 2D/3D nanocomposite with a feature control down to a few nanometers. This in operando dual nanofabrication capability of FEBIP is unmatched by any other nanopatterning techniques and opens a new design window for forming 2D/3D complex nanostructures and functional nanodevices.

Direct‐Writing of 2D Diodes by Focused Ion Beams (Adv. Funct. Mater. 34/2021)

Direct Electron-Beam Patterning of Monolayer MoS2 with Ice.

Peripheral-photoinhibition-based Direct Laser Writing with Isotropic 30 Nm Feature Size Using a Pseudo 3D Hollow Focus

High-throughput and Parallel Direct Laser Writing System Based on Screen Division Multiplexing of Spatial Light Modulator

A van der Waals pn heterojunction with organic/inorganic semiconductors

Laser Direct Writing Using Submicron-Diameter Fibers.

Reversible writing of high-mobility and high-carrier-density doping patterns in two-dimensional van der Waals heterostructures

Direct Laser Writing Breaking Diffraction Barrier Based on Two-Focus Parallel Peripheral-Photoinhibition Lithography

High-Resolution Three-Dimensional Sculpting of Two-Dimensional Graphene Oxide by E-Beam Direct Write

Direct-Writing Atom-by-Atom

(Invited) 2D Dimensional Quantum Materials for CMOS and Beyond CMOS Devices

Arrayed van der Waals Vertical Heterostructures based on 2D GaSe Grown by Molecular Beam Epitaxy

Controllable Carrier Doping in Two-Dimensional Materials Using Electron-Beam Irradiation and Scalable Oxide Dielectrics

Quasi-Direct Writing Of Diffractive Structures With A Focused Ion Beam

Facing the key challenges of two-dimensional electronics

Lateral Heterostructures: 1D p–n Junction Electronic and Optoelectronic Devices from Transition Metal Dichalcogenide Lateral Heterostructures Grown by One‐Pot Chemical Vapor Deposition Synthesis (Adv. Funct. Mater. 27/2021)

Tuning carrier density and phase transitions in oxide semiconductors using focused ion beams

Direct Writing Techniques in Microfabrication Using Focused Ion Beams

Enlightening 2D semiconductor inks

Laser Writable Multifunctional van der Waals Heterostructures