Formation-free resistive switching in nanocrystalline Tellurium oxide

Keerthana .,Venimadhav Adyam
DOI: https://doi.org/10.1088/1361-6528/ad321c
IF: 3.5
2024-03-11
Nanotechnology
Abstract:In this work, we report on the observation of resistive switching in the nanocrystalline Tellurium oxide (TeO x ) in ITO/TeO x /Ag device configuration. The TeO x films grown in an O 2 /Ar environment have dominant β-TeO 2 along with other polymorphs and amorphous TeO 2 . From the resistive switching characteristics, it is suggestive that the β-TeO 2 phase promotes the conductive filament formation across the highly insulating amorphous matrix. The memory device demonstrates bipolar resistive switching with excellent endurance, retention and on-off ratio. The device also features formation-free switching with low set and reset voltage (0.6 V and -0.8 V respectively) and displays multilevel switching upon varying compliance current. I-V characterization clarifies the conduction path is indeed filamentary type. The result highlights that TeO x can be a prominent resistive switching material for memory and brain-inspired computing devices.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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