Amorphous Zr-Cu thin-film alloys with metallic glass behavior

P. Zeman,M. Zítek,Š. Zuzjaková,R. Čerstvý
DOI: https://doi.org/10.1016/j.jallcom.2016.12.098
IF: 6.2
2017-03-01
Journal of Alloys and Compounds
Abstract:Binary Zr–Cu thin-film alloys were prepared by non-reactive conventional dc and impulse magnetron co-sputtering using two unbalanced magnetrons equipped with Zr and Cu targets. The magnetron with the Zr target was operated in a dc regime while the magnetron with the Cu target in a pulse regime either at low or high density discharge conditions. The elemental composition in the films was controlled in a very wide composition range (∼10–90 at.%). The evolution of the structure, thermal behavior, mechanical, electrical and surface properties of Zr–Cu films with increasing Cu content was systematically investigated. We found that Zr–Cu thin-film metallic glasses were prepared with the Cu content between approximately 30 and 65 at.% Cu independently of the low or high density discharge conditions used. A clear correlation between the evolution of the crystallization temperature and mechanical properties with increasing Cu content was observed. The deposition at the high density discharge conditions resulted in a preparation of the Zr–Cu thin-film metallic alloys with a compressive stress (<0 GPa), an enhanced hardness (>7 GPa), very smooth (surface roughness < 1 nm) and hydrophobic (water contact angle >100°) surface.
materials science, multidisciplinary,chemistry, physical,metallurgy & metallurgical engineering
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