Introducing Oxygen Vacancies into WO3 Thin Film for Improving Hydrogen Sensing Performance of Pd/WO3-x/AAO Sensors

Yu Zhang,Chen Hang,Hongchuan Jiang,Xiaohui Zhao,Xinwu Deng,Liufang Wang,Fengxiang Ma,Zhengjie Xu
DOI: https://doi.org/10.1016/j.snb.2024.136843
2025-01-01
Abstract:Introducing oxygen vacancy into semiconducting metal oxides (SMOs) is a strategic approach to promote their gas sensing performances. In this paper, the WO3-x thin films were meticulously deposited onto an anodic aluminum oxide (AAO) substrate, and the oxygen vacancies concentrations of WO3-x thin films were changed by adjusting the ratio of flux of Ar to O2 in magnetron sputtering process. Sequentially, a layer of palladium (Pd) was deposited on the WO3-x/AAO films, creating a nano-mesh structured hydrogen sensor with Pd as the catalytic element. The resulted amorphous WO3-x samples with varying concentration of oxygen vacancies were thoroughly analyzed using XPS and ESR, which confirmed that the oxygen vacancies concentration escalated with an increase in the ratio of flux of Ar to O2. The hydrogen sensitivity of prepared Pd/WO3-x/AAO sensors were examined. Our findings revealed an enhancement in hydrogen sensitivity for the sensors with an optimal concentration of oxygen vacancies. However, an excess of these vacancies was found to deteriorate their hydrogen sensing performance. Notably, the optimized Pd/WO3-x/AAO sensor exhibited a marked response even at a hydrogen concentration as low as 100 ppb, demonstrating its high sensitivity and selectivity towards hydrogen detection.
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