Study on Resistance of Crystalline GeTe Thin Films and Enhancement on Electrical Properties of Phase Change Switch

Sheng Qu,Jihua Zhang,Libin Gao,Hongwei Chen,Jiamei Wang,Shuaishuai Fu,Minghao Liu,Yao Ding

DOI: https://doi.org/10.1109/ted.2024.3400758

IF: 3.1

2024-01-01

IEEE Transactions on Electron Devices

Abstract:Chalcogenide phase change materials (PCMs) stand as promising contenders in the realm of radio frequency (RF) switches owing to their remarkable attributes including high switching speed, strong integration potential, and low-power consumption. This study endeavors to explore methods for reducing the resistance of germanium telluride (GeTe) film in its crystalline phase and consequently lowering the RF insertion loss (IL) in a phase change switch. The investigation revealed that oxidation in GeTe thin films induces changes in crystalline resistance. To mitigate oxidation, plasma bombardment with Ar (+) was employed, demonstrating a substantial decrease in the resistance of crystalline film. The optimized GeTe-based phase change switch achieved an ideal resistance of 7 Omega for the ON-state and 1.2 M Omega for the OFF-state, respectively. The R-OFF/R-ON ratio of the switch could reach 1.7 x 10(5). Furthermore, the optimized switch can handle RF power of + 37 dBm in the ON-state and self-actuates at 30 dBm in the OFF-state. RF measurements show that the IL is better than 0.4 dB and the isolation is better than 17 dB from 1 to 20 GHz.