Engineering the Siox Interfacial Layer of Si-Based Metal-Insulator-Semiconductor Junction for Photoelectrochemical Hydrogen Production

Yao Li,Chenglong Ding,Yanming Li,Jiongchong Fang,Guosong Zeng,Jingfu He,Changli Li
DOI: https://doi.org/10.1016/j.jcat.2024.115533
IF: 7.3
2024-01-01
Journal of Catalysis
Abstract:Photoelectrochemical (PEC) water splitting provides a potential method to produce renewable hydrogen energy, but there is still plenty of room for improving the efficiency and stability of photoelectrodes. In this paper, we present a metal-insulator-semiconductor (MIS) structure based on p-Si that enables stable and efficient water splitting by engineering the interfacial insulating layer. The silicon oxide (SiOx) film with appropriate thickness and low defects is regrown by a chemical oxidation process, which provides a high-quality insulating layer to passivate the p-Si. The carrier flux, barrier height and interfacial resistance of p-Si based MIS junction can be systematically tuned by controlling the thickness and quality of SiOx layer. Under AM 1.5G illumination, the optimized p-Si/SiOx/Ti/Pt photoelectrode shows an onset potential of 0.5 V vs. RHE, a maximum photocurrent of 28 mA/cm2 and a high applied bias photon-to-current efficiency (ABPE) of 6%. These results have significant implications for constructing MIS photoelectrodes towards effective water splitting.
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