Abstract:Quantum chemical approaches are very much significant in the field of corrosion chemistry to understand the structure-property relationship of various organic molecules as corrosion inhibitors. Here is the adsorption behavior of three organic azo-dyes, viz. 6-((4-(diethylamino)-2-methylphenyl)diazenyl)benzo[de]isochromene-1,3-dione (named as Dye-1); 4-[6-[2-[4-( N , N -Diethylamino)-2-methylphenyl]diazenyl]-1,3-dioxo-1 H -benz[de]isoquinolin-2(3 H )-yl]- N -(2-thiazolyl)benzenesulfonamide (named as Dye-2); 4-[6-[2-[4-( N , N -Diethylamino)-2-methylphenyl]diazenyl]1,3-dioxo-1 H -benz[de]isoquinolin-2(3 H )-yl]- N -(2-pyrimidinyl)benzenesulfonamide (named as Dye-3) on the rutile TiO 2 and ZnO surfaces have been explored via quantum chemical approach, i.e. density functional theory (DFT), local reactive sites analysis and molecular dynamic (MD) simulation studies. Global relativities of the dye molecules have been explored by calculating the energy of the frontier molecular orbitals, energy difference (Δ Ε ), electronegativity ( χ ), electron affinity ( A ), softness ( σ ), and hardness ( η ) like quantum chemical parameters. Furthermore, MD simulation study has been performed to comprehend the adsorption behaviour as well as the adsorption configuration of three selective dye molecules on TiO 2 and ZnO surfaces mimicking the real adsorption and surface protection phenomenon. The mechanisms of adsorption behaviour of three organic azo dyes on the TiO 2 and ZnO surfaces have been explored at the atomistic level. Fukui indices analysis revealed the presence of locally reactive sites responsible for adsorption. MD simulation results revealed the adsorption of dye molecules onto the metal oxide surfaces occurs in a horizontal fashion. The horizontal adsorption of dye molecules undergoes both physisorption and chemisorption on the metal oxide surface leading to greater surface coverage.

Quantum Chemical Calculations and Molecular Dynamics Simulations to Investigate the Mechanism of Interaction of Six Dye Levelers with Copper Surface

Uncovering the Dissociative Adsorption of the Leveler Janus Green B on Cu Electrodes at the Molecular Level

REMOVAL OF AQUEOUS Cu(II) WITH NATURAL KAOLIN: KINETICS AND EQUILIBRIUM STUDIES

Quantum chemical and molecular dynamics simulation approach to investigate adsorption behaviour of organic azo dyes on TiO2 and ZnO surfaces

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Computational analysis and experimental evidence of two typical levelers for acid copper electroplating

Strong Convection-Dependent Adsorption of Phenothiazine Skeleton Levelers and Their Application in Copper Electroplating

High Efficient Removal of Cu(II) by a Chelating Resin from Strong Acidic Solutions: Complex Formation and DFT Certification

Density functional theory study on the atomic structure and electronic states of Cu(l00) (√2 × 2 √2)R45°-O surface

Effect of Nitrogen-containing Groups on the Reduction of Copper Ions: in Situ Raman and AIMD

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Synthesis of Quaternary Ammonium Salts Based on Diketopyrrolopyrroles Skeletons and Their Applications in Copper Electroplating.

A comparison of typical additives for copper electroplating based on theoretical computation

First-Principles Calculations Of Cs Adsorbed On Cu(001): Quantum Size Effect In Surface Energetics And Surface Chemical Reactivities

Molecular dynamics analysis of adsorption process of anti-copper-corrosion additives to the copper surface

Aryl Modification of Diketopyrrolopyrrole-Based Quaternary Ammonium Salts and Their Applications in Copper Electrodeposition

Tetrazole Derived Levelers for Filling Electroplated Cu Microvias: Electrochemical Behaviors and Quantum Calculations

Unveiling the Potential and Mechanisms of 3,3'-Bicarbazole-Based Quaternary Ammonium Salts as Levelers