Improved photoresponse of graphitic carbon nitride films via pressure engineering

Yizhe Li,Xigui Yang,Chaofan Lv,Jinxu Qin,Chuang Zhang,Zhenfeng Zhang,Xuexia Chen,Jinhao Zang,Qing Lou,Lin Dong,Chong-Xin Shan

DOI: https://doi.org/10.1016/j.carbon.2022.08.044

IF: 10.9

2022-10-31

Carbon

Abstract:Herein, the photoresponse performance of g-C3N4 films with high crystallinity has been investigated under high pressure for the first time. It is found that the photocurrents are enhanced with increasing pressure, achieving 1.8 times increase at a mild pressure of approximately 3.6 GPa in comparison with the initial value. Theoretical calculation suggests that the photocurrent changes are mainly related to the bandgap reduction due to the increased interlayer interactions under compression. Our findings provide new insights into the control of the photoelectric performance of g-C3N4 materials by pressure engineering, and may promote the development of the pressure-controlled optoelectronic devices applications.

materials science, multidisciplinary,chemistry, physical