Exploring the High Dielectric Performance of Bi 2 SeO 5 : from Bulk to Bilayer and Monolayer

Xinyue Dong,Yuyu He,Yue Guan,Yuanhao Zhu,Jinxiong Wu,Huixia Fu,Binghai Yan
DOI: https://doi.org/10.1007/s40843-023-2737-8
2024-01-01
Abstract:Bi 2 SeO 5 has garnered considerable attention as a van der Waals (vdW) layered dielectric material featuring excellent electrical insulation properties. However, the related theoretical understanding of the dielectric properties of atomically thin films is still lacking. Here, we conducted the first-principles calculations to determine the dielectric performance of Bi 2 SeO 5 , showing a high average dielectric constant ( ε ) of >20 ranging from bulk to bilayer and monolayer. Besides, the conduction and valance band offsets between the monolayer Bi 2 SeO 5 and bilayer Bi 2 O 2 Se were calculated to be greater than 1 eV, suggesting that monolayer Bi 2 SeO 5 works well as the dielectric for atomically thin Bi 2 O 2 Se. Unlike h-BN or other two-dimensional (2D) vdW insulators, ε of Bi 2 SeO 5 is dominated by its ionic component and remains nearly constant as the thickness decreases, demonstrating an ultralow equivalent oxide thickness (EOT) of 0.3 nm for its monolayer form. Moreover, the high ε of monolayer Bi 2 SeO 5 survives under tensile or compressive strains up to 6%, which greatly facilitates its integration with various 2D semiconductors. Our work suggests that Bi 2 SeO 5 ultrathin films can serve as excellent atomically flat encapsulation and dielectric layers for high-performance 2D electronic devices.
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