An Effective Mobility Model for Tunneling Double-Gate MOSFET (T-Finfet)

Mansun Chan,Jin He,Xiaobin He,G.J. Hu,C Li,J Liu,Guang‐Lei Ma,James N. Pan
2018-01-01
Abstract:We have derived an analytical model for the effective field (Eeff) model of undoped Ultra-Thin Body (UTB) Double Gate (DG) SOI Tunneling MOSFETs ( T-FinFET) in this paper . The Eeff is directly linked to the carrier mobility in the strong inversion and can be used to predict the bias dependence of the effective mobility ( eff). Extensive simulations show that the Eeff model is not influenced by the quantum effect besides which indicates that its influence is limited to the constant zero-field mobility ( o) and independent of bias. The model predicts that for the same amount of inversion charge, a symmetric DG (SDG) MOSFET has higher eff than UTB or asymmetric DG (ADG) MOSFET especially at high gate bias or strong turn-on.
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