Characterization of MOS Structures Based on Poly (3,3≪tex>$^primeprimeprime$</tex>-Dialkyl-quaterthiophene)

Ni Zhao,Ognian Marinov,Gianluigi A. Botton,M. Jamal Deen,Beng S. Ong,Yiliang Wu,P. Liu
DOI: https://doi.org/10.1109/ted.2005.856172
IF: 3.1
2005-01-01
IEEE Transactions on Electron Devices
Abstract:Metal-polymer-oxide-silicon (MPOS) structures with poly(3,3'''-dialkyl-quaterthiophene) as an active semiconductor layer have been characterized by means of capacitance-voltage (C-V) methods at different ramping rates (dV/dt) for the voltage sweep in the quasi-static capacitance-voltage method (QCV), and at different frequencies (f) for the dynamic or high-frequency method (DCV or HCV). The observed dependency of the capacitance on ramping rate and frequency are explained with a frequency dependent carrier enhancement and a long relaxation time constant in the polymer. The surface modification of gate oxide is found to improve the carrier enhancement in the active polymer layer of MPOS.
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