Optical Patterning Fullerene Nanostructures with High Purity and High Surface Quality

Zhihao Zeng,Xiangping Li,Haiwei Wang,Changsheng Xie
DOI: https://doi.org/10.1063/5.0152366
IF: 5.6
2023-01-01
APL Photonics
Abstract:Nanoscale patterning of fullerene materials with peculiar intrinsic electronic and optical properties is of crucial importance for their widespread applications. However, it remains a daunting challenge for current methods that suffer from both complicated lithography procedures and additives of photopolymers or photochemicals detrimental to the pristine properties of fullerene. Here, we developed a contamination-free laser printing approach for in situ patterning of fullerene with nanoscale resolution and high purity. The optical trapping force within the tight focus provides a lithography-free means to form densely packed fullerene nanostructures with two-order-of-magnitude enhanced fluorescence emission and a surface roughness of 6 nm. In addition, versatile fullerene nano-patterns from dots to concentric rings can be realized by flexibly shaping the optical trapping force of higher-order Laguerre–Gaussian beams. These results open a new route to programmable and high-quality patterning of fullerene optoelectronic devices with complex nanostructures.
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