Investigation of Inorganic Integrated Film Capacitor Fabrication

Demiao Wang
2007-01-01
Abstract:MIM structure inorganic integrated film capacitors were fabricated on ceramic substrates (with rough surfaces),the Cr/Ag/Cr films series were chosed as electrodes,and the evaporated 2MgO·SiO2 films as insulating dielectric. The micrographs and SEM results show that the capacitors’ properties depends mainly on the dielectric films’ compactness. A proper post deposition thermal treatment is found helpful to improve the films` properties. However,excessive thermal treatment may lead to a negative effect because of crystallization and diffusion. The film capacitors obtained have achieved a breakdown field of more than 107 V/m,and tan δ is 0.01at 5 MHz.
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