Optimization of Pretreatment Process of Fine Grained Cemented Carbide and Properties of Diamond Coating
Wang Yiqian,Su Yifan,Zhang Yuming,Zhang Cheng,Lin Songsheng,Dai Mingjiang,Sun Zhipeng,Shi Qian
DOI: https://doi.org/10.12442/j.issn.1002-185x.20230045
2024-01-01
Rare Metal Materials and Engineering
Abstract:In order to expand the industrial application of diamond coating tool and improve the adhesive strength of diamond coating tool, the "Acid-Murakami-Acid" (AMA) three-step pretreatment process for cemented carbide with different WC grain size of 0.2, 0.4, 1.0 mu m was studied. The surface morphology of the pretreated substrate, cobalt content and coating morphology were analyzed by scanning electron microscope and EDS spectrometer. The phase structure of the coating was analyzed and characterized by Raman spectroscopy and X-ray diffraction spectroscopy. The scour resistance of the diamond coating was tested by dynamic impact experiments. The results show that the acid treatment plays an important role in removing Co. The smaller the grain size of WC, the longer the acid treatment time is required. The etching capacity of WC by Murakami treatment increases at first and then decreases, and the maximum Co exposure is reached at 3 min. Pretreatment can not only change the substrate internal WC and Co content, but also change the roughness of the substrate surface, which is consistent with the change rule of substrate surface Co content. Therefore, the best pretreatment process of WC-6%Co (0.2, 0.4, 1.0 mu m) substrates were determined. The optimal process for WC-6%Co (0.2 mu m) substrate was determined as A10+M3+ A10 s, the optimal process for WC-6%Co (0.4 mu m) substrate as A6+ M3+A30 s, and the optimal process for WC-6%Co (1 mu m) substrate as A2+M3+A2. After the three-step method, the substrates obtain uniform and compact diamond coatings, excellent scouring resistance and great adhesion strength, especially the WC-6%Co (1 mu m) substrate.