Epitaxial van der Waals contacts for low schottky barrier MoS 2 field effect transistors

Huawei Liu,Lizhen Fang,Xiaoli Zhu,Chenguang Zhu,Xingxia Sun,Gengzhao Xu,Biyuan Zheng,Ying Liu,Ziyu Luo,Hui Wang,Chengdong Yao,Dong Li,Anlian Pan
DOI: https://doi.org/10.1007/s12274-022-5229-y
IF: 9.9
2022-01-01
Nano Research
Abstract:Small contact resistance and low Schottky barrier height (SBH) are the keys to energy-efficient electronics and optoelectronics. Two-dimensional (2D) semiconductors-based field effect transistors (FETs), holding great promise for next-generation information circuits, still suffer from poor contact quality at the metal—semiconductor junction interface, which severely hinders their further applications. Here, a novel contact strategy is proposed, where Bi 2 Te 3 nanosheets with high conductivity were in-situ epitaxially grown on MoS 2 as van der Waals contacts, which can effectively avoid the damage to MoS 2 caused during the device manufacturing process, leading to a high-performance MoS 2 FET. Moreover, the small work function difference between Bi 2 Te 3 and MoS 2 (Bi 2 Te 3 : 4.31 eV, MoS 2 : 4.37 eV, measured by Kelvin probe force microscopy (KPFM)), enables small band bending and Ohmic contact at the junction interface. Electrical characterizations indicate that the MoS 2 FET device with Bi 2 Te 3 contacts possesses a high current on/off ratio (5 × 10 7 ), large effective carrier mobility (90 cm 2 /(V·s)), and low flat-band SBH (60 meV), which is favorable as compared with MoS 2 FET with traditional Cr/Au electrodes contacts, and superior to the vast majority of the reported chemical vapor deposition (CVD) MoS 2 -based FET device. The demonstration of epitaxial van der Waals Bi 2 Te 3 contacts will facilitate the application of 2D MoS 2 nanosheet in next-generation low-power consumption electronics and optoelectronics.
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