Interface barrier-induced conversion of resistive switching mechanism in Mn-doped BiFeO<sub>3</sub> memristor

Rui Su,Min Cheng,Awei Dong,Yuwei Zhao,Weiming Cheng,Rui Yang,Junbing Yan,Xiangshui Miao
DOI: https://doi.org/10.1063/5.0127006
IF: 4
2022-01-01
Applied Physics Letters
Abstract:Different from conductive filament (CF)-type counterparts, interface-type devices exhibit continuously gradual conductance changes, making them the potential for artificial synapses. In this paper, Mn-doped BiFeO3 (BFMO) devices with SrRuO3 and TiN bottom electrodes demonstrate the clear CF rather than the interface barrier type resistance-switching feature due to the high Schottky barrier. Considering the measured electron affinity of 3.52 eV and work function of 4.22 eV in the as-synthesized BFMO film (a weak n-type semiconductor, marked as n(-)), we fabricated a hetero-junction device with the Nb-doped SrTiO3 (NSTO) bottom electrode (a strong n-type semiconductor, marked as n(+)) exhibiting analog switch characteristics. The n(-)-n(+) hetero-junction between BFMO and NSTO reverses the operation polarity and leads to a barrier transition-dominated conductive behavior in the BFMO-based memristor. The device shows a large ON/OFF ratio over 1200, favorable stability after 10(4) s, continual multi-value characteristics, symmetrical long-term potentiation and depression, and synaptic plasticity with about 80 ns time constant. The investigation of resistive switching features, band structure, and synapse performance in this work provides a reference for the application of BiFeO3 in the field of the memristor. Published under an exclusive license by AIP Publishing.
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