Reactive Ion Etching Activating TiO2 Substrate for Planar Heterojunction Sb2S3 Solar Cells with 6.06% Efficiency

Fuge You,Shiwu Chen,Tianjun Ma,Feng Xiao,Chao Chen,Hsien-Yi Hsu,Haisheng Song,Jiang Tang
DOI: https://doi.org/10.1002/ente.202200940
IF: 4.149
2022-01-01
Energy Technology
Abstract:Antimony sulfide is a promising photovoltaic material for the top subcell of Si-based tandem solar cells due to its suitable bandgap, high absorption coefficient, low cost, and environmentally friendly properties. However, the electron transport layer (ETL) of antimony sulfide solar cells is generally based on CdS, while narrow-bandgap CdS (E-g = 2.4 eV) absorbs part of the short-wavelength light causing spectral loss. Unfortunately, Sb2S3 films could not be deposited uniformly on TiO2 substrate by the hydrothermal method. For the first time, reactive ion etching (RIE) treatment to TiO2 surface is developed to activate it for later Sb2S3 deposition. Based on this strategy, the obtained Sb2S3 film is almost the same as that deposited on CdS, smooth, dense, and uniform. The optimal device efficiency can reach 6.06%, a top value among TiO2/Sb2S3 devices with a new record of short-circuit current density (approximate to 19.4 mA cm(-2)). The high efficiency on RIE-treated TiO2 ETL is attributed to the high transparency of TiO2 and the high-quality Sb2S3 thin film with suppressed recombination in the Sb2S3 bulk film and TiO2/Sb2S3 interface. This work proposes a simple and efficient strategy for deposition of high-quality Sb2S3 thin films on inert substrates.
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