Reactive Ion Etching Activates TiO2 Substrate for Planar Heterojunction Sb2S3 Solar Cells with 6.06% Efficiency

Fuge You,Shiwu Chen,Tianjun Ma,Feng Xiao,Chao Chen,Hsien-Yi Hsu,Haisheng Song,Jiang Tang
DOI: https://doi.org/10.1002/ente.202200940
IF: 4.149
2022-10-12
Energy Technology
Abstract:Antimony sulfide (Sb2S3) is a promising photovoltaic material for the top sub‐cell of Si‐based tandem solar cells due to its suitable bandgap, high absorption coefficient, low cost, and environmentally friendly properties. However, the electron transport layer (ETL) of antimony sulfide solar cells is generally based on CdS, while narrow‐bandgap CdS (Eg ∽ 2.4 eV) absorbs part of short‐wavelength light causing spectral loss. It is a pity that Sb2S3 films could not be deposited uniformly on TiO2 substrate by hydrothermal method. For the first time, we develop reactive ion etching (RIE) treatment to TiO2 surface so as to activate it for later Sb2S3 deposition. Based on above strategy, the obtained Sb2S3 film is almost the same as that deposited on CdS, smooth, dense and uniform. The optimal device efficiency can reach 6.06%, a top value among TiO2/Sb2S3 devices with a new record of short‐circuit current density (∽19.4 mA/cm2). The high efficiency on RIE treated TiO2 ETL is attributed to high transparency of TiO2 and high quality Sb2S3 thin film with suppressed recombination in Sb2S3 bulk film and TiO2/Sb2S3 interface. This work proposes a simple and efficient strategy for deposition of high quality Sb2S3 thin films on inert substrates. This article is protected by copyright. All rights reserved.
energy & fuels
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