Self-selective Analogue FeOx-based Memristor Induced by the Electron Transport in the Defect Energy Level

Changrong Liao,Xiaofang Hu,Xiaoqin Liu,Bai Sun,Guangdong Zhou
DOI: https://doi.org/10.1063/5.0102076
IF: 4
2022-01-01
Applied Physics Letters
Abstract:A Fe2O3 film homojunction was orderly prepared by magnetron sputtering and a hydrothermal method. The Fe2O3 homojunction-based memristor exhibits an obvious self-selective effect as well as a typical analogue resistive switching (RS) memory behavior. A desirable self-rectifying voltage range (−1 to 1 V), stable resistance ratio, good cycling endurance (>104 cycles), and long retention time (>104 s) can be obtained from the Fe2O3 homojunction-based memristor. Oxygen vacancies (Vo) are inevitably generated during the growth of the Fe2O3 film. The self-selective analogue RS memory behavior is ascribed to the electron tunneling behavior between the potential barrier generated by the FeOx contact and the electron filling dynamic in the Vo-based traps. This work provides a simple method to prepare a self-selective analogue memristor and lays the foundation for the core device of neuromorphic computing.
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