A Novel 3300V Conductivity Modulation Enhanced IGBT with P-type Schottky Contact and Partial N-type Buried Layer

Yifei Lan,Jinping Zhang,Rongrong Zhu,Jiang Liu,Rui Jin,Yaohua Wang,Bo Zhang
DOI: https://doi.org/10.1117/12.2634548
2022-01-01
Abstract:A novel 3300V conductivity modulation enhanced planar gate IGBT (CE-IGBT) with P-type Schottky contact and partial N-type buried layer is proposed. The proposed CE-IGBT features a P-type Schottky contact between the P-base region and emitter metal as well as a partial highly-doped N-type buried layer located in the P-base region. The Schottky contact forms a hole barrier by increasing the potential of the P-base region and the N-type buried layer suppresses the hole flowing above it. The simulation results show that compared with the conventional planar gate IGBT (Con-IGBT), the proposed CE-IGBT not only reduces the on-state voltage drop (Vceon) but also improves the trade-off relationship between the Vceon and turn-off power loss (Eoff). Compared with the Con-IGBT, the Vceon of the CE-IGBT with same P-base doping concentration is reduced by 32.7%, and the CE-IGBT pro with same threshold voltage (Vth) is reduced by 30.9%. At same Vceon of 2.65 V, compared with the Con-IGBT, the Eoff of the CE-IGBT and CE-IGBT pro is reduced by 37.3% and 34.9%, respectively. Moreover, the proposed device demonstrates good reverse biased safe operating area (RBSOA).
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