8.2: High Performance Oxide Thin Film Transistors Fabricated by Atomic Layer Deposition Process

Dedong Han,Huijin Li,Junchen Dong,Xiaobin Zhou,Qi Li,Jingyi Wang,Xing Zhang,Yi Wang

DOI: https://doi.org/10.1002/sdtp.15043

2021-01-01

SID Symposium Digest of Technical Papers

Abstract:SID Symposium Digest of Technical PapersVolume 52, Issue S2 p. 141-141 Technical Sessions: Session 8: Oxide TFT (Active-Matrix Devices) 8.2: High Performance Oxide Thin Film Transistors Fabricated by Atomic Layer Deposition Process Dedong Han, Corresponding Author Dedong Han handedong@pku.edu.cn Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorHuijin Li, Huijin Li Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorJunchen Dong, Junchen Dong Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorXiaobin Zhou, Xiaobin Zhou Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorQi Li, Qi Li Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorJingyi Wang, Jingyi Wang Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorXing Zhang, Xing Zhang Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorYi Wang, Yi Wang Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this author Dedong Han, Corresponding Author Dedong Han handedong@pku.edu.cn Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorHuijin Li, Huijin Li Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorJunchen Dong, Junchen Dong Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorXiaobin Zhou, Xiaobin Zhou Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorQi Li, Qi Li Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorJingyi Wang, Jingyi Wang Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorXing Zhang, Xing Zhang Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this authorYi Wang, Yi Wang Institute of Microelectronics, Peking University, Beijing, ChinaSearch for more papers by this author First published: 26 August 2021 https://doi.org/10.1002/sdtp.15043AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat No abstract is available for this article. Volume52, IssueS2International Conference on Display Technology (ICDT 2021)August 2021Pages 141-141 RelatedInformation