Performance of hydrogen-terminated diamond MOSFET with LaB<sub>6</sub>/Al<sub>2</sub>O<sub>3</sub> bilayer dielectric

Shi He,Yan-Feng Wang,Genqiang Chen,Minghui Zhang,Wei Wang,Xiaohui Chang,Qi Li,Qianwen Zhang,Tianfei Zhu,Hong-Xing Wang
DOI: https://doi.org/10.1016/j.diamond.2021.108646
IF: 3.806
2021-01-01
Diamond and Related Materials
Abstract:A diamond-based field effect transistor with LaB6/Al2O3 bilayer has been fabricated. Al2O3 and LaB6 layer were deposited by atomic-layer-deposition and electron beam evaporation system, respectively. The LaB6/Al2O3 bilayer shows a high dielectric constant (29.8). The leakage current density of LaB6/Al2O3 diamond metal insulator-semiconductor field effect transistor keeps lower than 1 x 10(-6) A cm(-2) when the gate bias changed from 5 V to -5 V. This device operates in a p-type depletion mode, whose maximum drain-source current, threshold voltage, maximum transconductance, effective mobility and sheet hole density are determined to be -73.8 mA.mm -1, 2.2 V, 10.4 mS.mm(-1),128 cm(2).V-1.s(-1), and 3.2 x 10(13) cm(-2), respectively.
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