Realizing n-type gete through suppressing the formation of cation vacancies and bi-doping*

Min Zhang,Chaoliang Hu,Qi Zhang,Feng Liu,Shen Han,Chenguang Fu,Tiejun Zhu
DOI: https://doi.org/10.1088/0256-307X/38/12/127201
2021-01-01
Chinese Physics Letters
Abstract:It is known that p-type GeTe-based materials show excellent thermoelectric performance due to the favorable electronic band structure. However, n-type doping in GeTe is of challenge owing to the native Ge vacancies and high hole concentration of about 10(21) cm(-3). In the present work, the formation energy of cation vacancies of GeTe is increased through alloying PbSe, and further Bi-doping enables the change of carrier conduction from p-type to n-type. As a result, the n-type thermoelectric performance is obtained in GeTe-based materials. A peak zT of 0.34 at 525 K is obtained for (Ge0.6Pb0.4)(0.88)Bi0.12Te0.6Se0.4. These results highlight the realization of n-type doping in GeTe and pave the way for further optimization of the thermoelectric performance of n-type GeTe.
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