Nanometer-Thick MoS2 Films Made by High-Temperature Atomic Layer Deposition As Coatings for Friction Reduction

Lei Liu,Rongkai Gao,Youqiang Xing,Ze Wu
DOI: https://doi.org/10.1021/acsanm.2c00439
IF: 6.14
2022-01-01
ACS Applied Nano Materials
Abstract:Ultralow friction can be achieved with nanometer-thick MoS2 due to its weak interlayer van der Waals interactions. As a method of film covering on complex surfaces, atomic layer deposition (ALD) is expected to be applied widely for its unique ability to control the thickness. In this work, two different growth modes are found during the ALD process at 400 and 700 degrees C that can affect the nanofriction properties of MoS2 films. The classical island growth mode happening at 400 degrees C makes nanometer-thick MoS2 films achieve increasing roughness and low coverage along with ALD cycles. The topography of MoS2 will further deteriorate its friction property. However, compared with the island growth mode, nanometer-thick MoS2 films deposited by the growth mode at 700 degrees C have low roughness and great single-layer coverage thanks to their obvious lateral and longitudinal growth processes. In the end, the signal-layer coverage of MoS2 deposited by ALD at 700 degrees C can reach 80%, and its friction reduction ratio at 700 degrees C further increases to 50-65% without deterioration. The preparation of nanometer-thick MoS2 films with high precision is expected to meet the needs of precision instruments that require lubrication.
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