Highly Efficient Horizontal Tunnel Diode Electron Sources

Zhiwei Li,Gongtao Wu,Xianlong Wei
DOI: https://doi.org/10.1109/icops37625.2020.9717709
2020-01-01
Abstract:A high-efficiency electron emitting system is highly desired throughout the development of vacuum electronics. Here we propose a new electron source based on metal-insulator-metal (MIM) horizontal tunnel diode (HTD) [1], where hot electrons are driven into the conduction band of insulator and emitted into the vacuum finally. This structure allows electrons travel near the surface of the material, overcoming the bottleneck of emission efficiency in layer-stacked MIM or MOS electron sources due to the fierce energy dissipation in top layer electrodes. An electron-emitting horizontal tunnel diode based on electroformed silicon oxide is fabricated [2] on a chip by using semiconductor micro fabrication technology. This electron source shows an emission current of up to several microamperes, with an emission efficiency over 16% (emission current to diode current) in a vacuum of 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">−3</sup> Pa. Compared to other on-chip electron sources, the HTD owns many advantages, including a low operating voltage, fast temporal response, high emission density and efficiency, convenient fabrication and integration, and stable emission in modest vacuum. This makes HTD a promising on-chip electron source in future applications.
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