High-Performance Sputter-Prepared Metal-Oxide Thin-Film Transistors Based on Solution-Processed Targets
Yuzhi Li,Shiben Hu,Chan Guo,Siting Chen,Jiantai Wang,Shenghan Zou,Zhangxu Pan,Yue Zhou,Linfeng Lan,Zheng Gong
DOI: https://doi.org/10.1109/led.2022.3224920
IF: 4.8157
2022-12-31
IEEE Electron Device Letters
Abstract:Metal-oxide (MO) thin-film transistors (TFTs) can be made using low-cost solution-processing methods, which however, generally show compromised TFT performances partially arising from the low film density. To address this challenge, here we proposed a method that employed solution-processed MO film as a target to prepare sputtered MO TFTs. For purposes of illustration, Pr doped indium gallium oxide (InGaPrO) was chosen as the main MO semiconductor material to be studied. The sputter-prepared In0.619Ga0.336Pr0.045Ox TFTs based on solution-processed film targets exhibited a saturation mobility ( of 10.37 ± 0.41 cm2/Vs, a turn-on voltage ( of −1.42 ± 0.37 V, an ratio of > , and negligible hysteresis, while the conventional solution-processed counterparts displayed an inferior of 1.59 ± 0.11 cm2/Vs. Negative bias illumination stress stability tests revealed that sputter- and solution-processed InGaPrO TFTs had negative shifts of 5.4 and 1.2 V, respectively, which is mainly related to the change in film density. The proposed method was further extended to fabricate low-temperature, high-performance InOx and In0.95Pr0.05Ox TFTs with of 24.33 ± 0.42 cm2/Vs and 21.82 ± 0.81 cm2/Vs, revea- ing the potential of using solution-processed film targets for fabricating a wide range of sputtered MO TFTs.
engineering, electrical & electronic