Influence of growth temperature and V/III ratio on Au-assisted In x Ga 1−x As nanowires

A. S. Ameruddin,H.H. Tan,H. A. Fonseka,Qiang Gao,J. Wong-Leung,Patrick Parkinson,Steffen Breuer,Chennupati Jagadish
DOI: https://doi.org/10.1109/commad.2012.6472348
2012-01-01
Abstract:In x Ga 1−x As nanowires were grown using metal-organic chemical vapour deposition (MOCVD) with various growth temperatures and V/III ratios. The morphology of these nanowires and the composition distribution along the nanowire were studied as a function of these growth parameters. With higher growth temperature and lower V/III ratio, the tapering of the nanowires is reduced. However, the incorporation of Ga in the nanowires is also reduced with lower V/III ratio. The composition distribution along the nanowires is non-uniform with typically In-rich bases and Ga-rich tips.
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