Plasmonic Lithography: from Superlens to Hyperlens and Recent Metamaterial Development

Zhaoyu Nie,Sui Yang,Xiang Zhang

DOI: https://doi.org/10.1117/12.2583561

2021-01-01

Abstract:Plasmonic lithography breaks the diffraction limit by utilizing the otherwise lost evanescent fields produced by light sources with wavelengths close to or within the visible spectrum. With the lower cost of high-power femtosecond laser systems, plasmonic lithography opens a new approach towards the next generation semiconductor manufacturing. In the past years, we have demonstrated different types of plasmonic lithography, ranging from Superlens, Flying plasmonic lens, to Hyperlens, and successfully achieved 22nm half-pitch resolution. Hyperlens, made of hyperbolic metamaterials, stands out for its capability of exposing a large field of view while maintaining a good resolution. Although the resolution of the Hyperlens is inversely proportional to the unit cell thickness of metamaterial, fabrication of thin metal layers has long been a challenge. We report in this study an ultrathin Hyperlens that permits the propagation of unprecedented high spatial frequencies, 12ko, through the metamaterial. This hyperbolic metamaterial consists of alternating metal and dielectric materials with thickness as thin as 2nm, which potentially leads to patterning with sub-10 nm resolution.