Broadband Dispersion Optimization Enabled by Coupled Silicon Nitride Waveguides with a Partially Etched Gap

Zijun Yao,Yu Zhang,Xinxuan Ma,Yuhang Wan,Zheng
DOI: https://doi.org/10.1364/fio.2019.jtu3a.95
2019-01-01
Abstract:Partially etched gap is introduced to optimize the dispersion performance of coupled silicon nitride waveguides. Anomalous low dispersion over a 220 nm range around 1500 nm can be realized with 515 nm-thick SiN waveguides.
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