The stress and microstructure of reactively sputtered Ni/Ti multilayers with different d-spacing

Yufei Feng,Runze Qi,Zhong Zhang,Qiushi Huang,Zhanshan Wang
DOI: https://doi.org/10.1364/oic.2019.fb.6
2019-01-01
Abstract:The stress and microstructure of reactively sputtered Ni/Ti multilayers with different bilayer is investigated for applications in neutron optical devices. The microstructure of multilayers has been characterized by GIXR, XRD and XPS measurements.
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