2718 Behaivor of Dies and Forming Materials in 50nm Nanoimprint Forming of Metallic Glass

Yasuyuki FUKUDA,Yasunori SAOTOME,Hisamichi KIMURA,Akihisa INOUE
DOI: https://doi.org/10.1299/jsmemecjo.2006.1.0_165
2006-01-01
The proceedings of the JSME annual meeting
Abstract:Nanoimprint technology is a promising method for mass production of micro- and nano-devices with low cost. Viscous materials such as thermoplastic materials and oxide glasses have been used for nanoimprint and metallic glasses also exhibit perfect Newtonian viscous flow in the supercooled liquid state and superior nano-formability under very low stresses. In this study, we fabricated the nano-dies with periodic structure of 50nm or less in intervals by FIB assisted CVD and Reactive Ion Etching (RIE) of SiO_2, and by using these dies, nanoimprint of Pt-based metallic glass was successfully performed. We observed traces of slip at nanoimprined area on the surface of the specimen and the trace was caused by a macroscopic material flow along die surface associated with vertical compressive deformation. These results demonstrate the performance of the fabrication method of nanodies and that the metallic glasses are expected for one of the most promising materials for nanoimprint.
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