Abstract:Thin-film lithium niobate (TFLN) has been considered as one of the most important platforms for constructing high-performance photonic integrated devices such as electro-optic modulators, frequency combs, classical/quantum light sources, and large-scale photonic integrated circuits, benefiting from its excellent optical properties of TFLN. The fabrication quality of TFLN photonic integrated devices plays an important role in the performance and the integration scale of these devices. As one of the element photonic structures, the state-of-the-art TFLN microrings reach an intrinsic Q factor higher than 10^7 with ultra-smooth sidewalls, fabricated by photolithography assisted chemo-mechanical etching (PLACE). However, it is isolated on the chip surface and a tapered fiber is required to couple the light into and out of the resonator. Furthermore, it is difficult to maintain such high-Q factors when the microrings are monolithically integrated with bus waveguides by PLACE, resulted from large coupling loss with biggish coupling gap. Here, a relatively narrow gap of an ultra-high Q microring monolithically integrated with the bus-waveguide is achieved with 3.8 um by optimizing PLACE process, and a high temperature annealing is carried out to improve the loaded (intrinsic) Q factor with 4.29 X 10^6 (4.04 X 10^7), leading an ultra-low propagation loss of less than 1 dB/m, which is approximately 3 times better than the best values previously reported in ion-slicing TFLN platform.

Monolithically integrated waveguide-coupled single-frequency microlaser on erbium-doped thin film lithium niobate

Monolithic single-frequency microring laser on an erbium-doped thin film lithium niobate fabricated by a photolithography assisted chemo-mechanical etching

Microlaser based on a hybrid structure of a semiconductor nanowire and a silica microdisk cavity.

Low-Threshold Microlaser in Er : Yb Phosphate Glass Coated Microsphere

Monolithic Integration of a Lithium Niobate Microresonator with a Free-Standing Waveguide Using Femtosecond Laser Assisted Ion Beam Writing.

Coherent mode-combined ultra-narrow-linewidth single-mode micro-disk laser

Monolithic Integration of a High-Quality Factor Lithium Niobate Microresonator with a Free-Standing Membrane Waveguide Using Femtosecond Laser Assisted Ion Beam Writing (FLAIBW)

Electro-optic tuning of a single-frequency ultranarrow linewidth microdisk laser

Toward On-Chip Unidirectional and Single-Mode Polymer Microlaser

On-chip Integrated Waveguide Amplifiers on Erbium-doped Thin Film Lithium Niobate on Insulator

Integrated Ytterbium-Doped Lithium Niobate Microring Lasers

On-chip erbium-doped lithium niobate microring lasers

Monolithic Yb3+-doped Thin Film Lithium Niobate Microring Laser Fabricated by Photolithography-Assisted Chemo-Mechanical Etching Technology

On-chip erbium-doped lithium niobate microcavity laser

Electro-optically Tunable Microring Laser Monolithically Integrated on Lithium Niobate on Insulator.

On-chip Lithium Niobate Heterogeneous Photonic Crystal Nanocavity Laser

On‐chip integrated waveguide amplifiers on erbium‐doped thin‐film lithium niobate on insulator

Integrated Lithium Niobate Microring Resonators Fabricated With 515 nm Femtosecond Laser Ablation

Ultra-high Q lithium niobate microring monolithically fabricated by photolithography assisted chemo-mechanical etching

Microdisk Lasers on an Erbium-Doped Lithium-Niobite Chip

Single-frequency Integrated Laser on Erbium-Doped Lithium Niobate on Insulator.