Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers

Jianuo Zhou,Xuemiao Li,Hai Deng
DOI: https://doi.org/10.2494/photopolymer.34.329
2021-01-01
Journal of Photopolymer Science and Technology
Abstract:Series of Si-containing, especially polyhedral oligomeric silsesquioxane (POSS)containing fluorinated block copolymers (BCPs), poly(styryl polyhedral oligomeric silsesquioxane)-block-poly(hepatafluorobutyl methacrylate) (PStPOSS-b-PHFBMA) were synthesized via living polymerizations. The flory-huggins parameter (chi, at 150 degrees C) of PStPOSS-b-PHFBMA BCP was 0.060. Highly ordered hexagonal domain with 13.2 nm dspacing was observed by small- angle X-ray scattering (SAXS) after 10 h 160 degrees C annealing, exhibiting rough line patterns in scanning electron microscope (SEM). SiO1.5 residue (13.7 wt%) still remained after 700 degrees C sintering in thermal gravimetric analysis (TGA).
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