High Optoelectronic Performance of a Local-Back-gate ReS2/ReSe2 Heterojunction Phototransistor with Hafnium Oxide Dielectric.

Yu-Chun Li,Xiao-Xi Li,Guang Zeng,Yu-Chang Chen,Ding-Bo Chen,Bo-Fang Peng,Li-Yuan Zhu,David Wei Zhang,Hong-Liang Lu
DOI: https://doi.org/10.1039/d1nr02728j
IF: 6.7
2021-01-01
Nanoscale
Abstract:A high optoelectronic performance ReS2/ReSe2 van der Waals (vdW) heterojunction phototransistor utilizing thin hafnium oxide (HfO2) as a local-back-gate dielectric layer was prepared and studied. The heterojunction-based phototransistor exhibits a superior electrical performance with a large rectification ratio of ∼103. Furthermore, unlike diode-like heterojunction devices, the innovative introduction of a local-back-gate in this phototransistor provides an outstanding gate-tunable capability with an ultra-low off-state current of 433 fA and a high on/off current ratio of over 106. And under optical excitation of a wide spectrum from 400 to 633 nm, an excellent photodetection responsivity at the 104 A W-1 level and the maximum normalized detectivity of 1.8 × 1015 Jones @ 633 nm have been demonstrated. Such high performances are attributed to the band alignment of the type-II heterojunction and the suppression of dark current by the local-back-gate. This work provides a promising reference for two-dimensional (2D) Re-based heterojunction optoelectronic devices.
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