Sub-bandgap Absorption and Photo-Response of Molybdenum Heavily Doped Black Silicon Fabricated by a Femtosecond Laser

Yang,Ji-Hong Zhao,Chao Li,Qi-Dai Chen,Zhan-Guo Chen,Hong-Bo Sun
DOI: https://doi.org/10.1364/ol.425803
IF: 3.6
2021-01-01
Optics Letters
Abstract:Molybdenum (Mo)-doped black silicon (Si) is obtained by using femtosecond laser irradiation. The concentration of Mo atoms at the depth from 10 to 200 nm has exceeded 10 19 c m − 3 . In contrast, the carrier concentration in the Mo-doped layer is lower than 10 15 c m − 3 . The surface morphologies with ripple and conical spike microstructures are formed by changing the pulsed laser fluences. The Mo-doped Si samples exhibit a sub-bandgap ( 1100 ∼ 2500 n m ) absorptance of more than 60% at a wavelength of 1310 nm. A Mo-doped Si photodetector is made, and the responsivity of the device for 1310 nm is up to 76 mA/W at a − 10 V bias.
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