Fabrication of Si3 N4 nanopore for DNA detection

Jian Ma,Xing Wang,Kun Li,Anping Ji,Haojie Yang,Jinjie Sha,Yunfei Chen
DOI: https://doi.org/10.3969/j.issn.1001-0505.2017.02.012
2017-01-01
Abstract:Main parameters affecting the structure of nanopore during focused ion beam (FIB) sputtering silicon nitride membrane were studied:the sputtering time and the current of ion beam.Based on the optimizated FIB sputtering process,the FIB was used to reduce the thickness of the silicon nitdde membrane firstly and then sputter the nanopore.This fabrication process could improve the structure of the nanopore,including the size and the cone of the nanopore.Finally,using the fabricated nanopore,the signature of 48 kb λ-DNA was studied when DNA molecules were translocated through Si3N4 nanopore.The result shows when the nanopore size the smaller,the DNA molecular is easily straight through the nanopore.Meanwhile a simple calculation model for the blocking current caused by DNA translocation is proposed.
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