Numerical Simulation on Statistical Models of Carrier Mobility in Si

LUO Heng,DENG Lianwen,YI Tulin,HUANG Shengxiang,HU Zhaowen,ZHOU Kesheng
2011-01-01
Abstract:Carrier mobility is an important parameter for characterizing the conductivity of the semiconductor material.Based on the scattering mechanism of carrier mobility,Boltzmann equation and Mathiessen law,Boltzmann statistical model was established for carrier mobility of Si by statistically averaging the drift velocity of carriers with different thermal velocity.The affecting factors and changing trend of carrier mobility were calculated and analyzed and the saturated drift velocities under electrical field were derived,vdn=1.1×107cm/s,vdp=8.7×106cm/s.Results are in good agreement with the experimental results,indicating its fitness for the presented statistical model.
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