Review on Measurements of Microwave Dielectric Properties of Ferroelectric Thin Film

CHEN Haijing,ZHAI Jiwei,YAO Xi
DOI: https://doi.org/10.3321/j.issn:1005-023x.2006.11.030
2006-01-01
Abstract:Ferroelectric thin film has enormous potential applications in microwave devices. Its dielectric properties in the range of microwave frequency are one of the most important factors to put it into application. Several measurement methods of microwave dielectric properties, which are simple and easy to be used, are reviewed and summarized in this paper. The applicability, reliability and the requirements about the samples in these methods are emphasized especially. Finally, the prospect of these methods is also mentioned.
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