MBE growth and STM analysis of InGaAs quantum dots with As intermittent interruption

Jihong WANG,Zijiang LUO,Xun ZHOU,Zhao DING
DOI: https://doi.org/10.3969/j.issn.1001-9731.2017.05.005
2017-01-01
Abstract:Different thickness of InGaAs quantum dots were prepared through intermittent interruption growth(IIG) of As resource in molecular beam epitaxy (MBE) and the morphologies of them were studied and analyzed by reflection high energy electron diffraction (RHEED) and scanning tunneling microscopy (STM).The results show that the uniformity of quantum dots was improved under intermittent interrupt growth and the morphologies of quantum dots were controlled by the growth temperature and the amount of material deposited.A larger amount of material deposited could lead to higher density and more uniformity of quantum dots could be attained at higher growth temperature in a special range.There were three obvious differences phases such as layer-by-layer growth, formation and self-ripen phases of quantum dot and two transition points which were Stranski-Krastanow (SK) and self-ripen transition in the process of growth of InGaAs quantum dots.
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