Microstructure and ferromagnetism of Zn1-x Fex O films prepared by magnetron sputtering process

Duo-jie GENGZANG,Shu-yi MA,Wen-qi LI,Yu-zhen MAO,Jing LUO,Liang CHENG
DOI: https://doi.org/10.3969/j.issn.1001-9731.2014.21.017
2014-01-01
Abstract:Zn1 -x Fex O (x =1.0%,3.0%,5.0%)thin films deposited on Si were successfully prepared by radio frequency magnetron sputtering.The microstructure,chemical composition,valence states,morphology and ferromagnetism of the films had been investigated by X-ray diffraction (XRD),X-ray photoelectron spectrosco-py (XPS),scanning electronic microscopy (SEM)and vibrating sample magnetometer (VSM),respectively. The results indicate that highly c -axis preferential orientation of Zn1 -x Fex O films with wurtzite phase was suc-cessfully fabricated by Fe doping.Valence state of Fe in Zn1 -x Fex O films was a mixture of 2+ and 3+.The re-sults of VSM experiment proved the ferromagnetism of Zn1 -x Fex O at room temperature.The sources of ferro-magnetic are attributed to magnetic polaron induced by the magnetic ions and the vacancy defects.
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