Preparation of High Molecular Ratio Cryolite Using Invalid Phosphoric Acid Based Polishing Solution

Guo Changming,Wu Jun,Wei Liutuan,Cui Xuemin,Li Xuanhai
DOI: https://doi.org/10.3969/j.issn.1001-1250.2016.10.038
2016-01-01
Abstract:By adding sodium fluoride in invalid phosphoric-based acid polishing solution to prepare high molecular ratio cryolite via sodium fluoride reaction with Al3+from invalid phosphoric-based acid polishing solution. Results indicated that,with reaction temperature of 60 ℃,reaction time of 40 min,n( NaF) ∶ n( Al)=1. 3,sedimentation time was 1. 5 d,aluminum re-moval rate was 98. 6%. The cryolite molecular ratio of NaF to AlF3 is 3. 81. The production process not only recycled the polis-hing liquid,and production process is simple,cryolite has high molecular ratio and yield rate. It has good application prospect.
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