Microstructural Characterization and Growth Kinetics of the Reaction Layer in U-1Owt% Zr/Zircaloy-4 Diffusion Couples

Yuting Zhang,Xin Wang,Pengchuang Liu,Gang Zeng,Xiaoxuan Pang,Jianping Jia,Liusi Sheng,Pengcheng Zhang
2018-01-01
Rare Metal Materials and Engineering
Abstract:To investigate the compatibility and diffusion behavior between U-Zr alloys and Zr-4 alloys,solid-to-solid U-10wt%Zr/Zr-4 diffusion couples were assembled by vacuum hot pressing and then annealed under vacuum at temperatures ranging from 580 ℃ to 1100 ℃ for various time.Scanning and transmission electron microscopes were employed to analyze the microstructures and composition profiles at the interfaces of the couples.The compatibility between the two alloys was investigated.δ-UZr2 and ~20-nm-thin U-rich layers existed in the vacuum-hot-pressed samples.The interdiffusion coefficient constant and activation energy are found to be (4.23±0.63)×10-6 m2/s and (160.73±1.67) kJ/mol,respectively.The interdiffusion coefficients of the U-10wt% Zr/Zr-4 alloy couples are higher than those of U-Zr alloys,especially at low temperature.
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