X-Y Micropositioning Piezostage Design with Large Workspace Density

CAO Ruimin,HAO Lina,GAO Jinhai
DOI: https://doi.org/10.3969/j.issn.1004-132X.2017.09.002
2017-01-01
Abstract:Aiming at the problems of small microstage workspace density,a kind of 2-DOF sym-metrical parallel microstage was put forward herein.First,the main deformation factors were analyzed in the displacement amplifier;second,the stiffnesses of circular flexible hinge,parallel plate flexible hinge and corner-filleted flexible hinge were calculated;third,the energy method and the displace-ment matrix were utilized to get the output force formula of parallelogram displacement amplifier, displacement formula of the stage movement;finally,the variables of microstage were optimized and the optimal results were verified through the simulations and experiments.Results show that the workspace and workspace density may reach to 143.7μm×142.1μm and 2.521μm2/mm2 respectively, thus it may realize a higher workspace density.
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