Progress of Research on Chromium Plating with Trivalent Chromium Compound

HONG Yan,JI Meng-bo,HE An-guo,WEI Zi-dong

DOI: https://doi.org/10.3969/j.issn.1001-3849.2005.04.005

2005-01-01

Abstract:The removal of impurities in the bath and the hard chromium plating process were discussed. Trivalent chromium plating is highly sensitive to impurities. A trace of impurity would exacerbate the coatings quality down. Usually sedimentation, ion exchange resin and chelater are adopted to remove impurities. The difficulty to get hard chromium coating is another obstacle need to be solved in production. There are two reasons responsible to this difficulty. One is the hydrogen evolution at cathode that leads to the rise of pH value at the cathode, and in turn makes the Cr~(3+) change into a hydroxides, adsorption of which on the substrate results in the trivalent chromium coating non-compact and loose, and prevents the plating from conduction. Then a thick coating cannot be obtained and only soft chromium coating could be expected. Another one of the reasons is related to Cr~(6+), the products of Cr~(3+) oxidation which poisons the plating solution. It is necessary for getting a hard coating to control the pH value of the plating solution or to use a better pH adjustor in the plating bath.