Synthesis and Application of CVD Diamond Films

戚学贵,陈则韶,陈莉

DOI: https://doi.org/10.3969/j.issn.1003-353x.2001.06.017

2001-01-01

Abstract:The paper reviews the application of diamond films and the methods used for chemical vapor deposition diamond films at low pressure. The advantages and disadvantages of these methods are also discussed respectively.

What problem does this paper attempt to address?

Progress and Application Status of CVD Diamond Thick Film Coated Tools

匡同春,王晓初,王成勇,刘正义

DOI: https://doi.org/10.3969/j.issn.1006-852X.2000.02.011

2000-01-01

Abstract:CVD diamond thick film is a pure diamond material with full polycrystallinity synthesized by chemical vappor deposition method. It can be in a thick sheet form of freestanding. Its physical property is much closer to that of natural diamond, and its chemical characteristic is the same as that of natural diamond. This review focused briefly on the research development, preparation technique, characteristic and property, machining test result and application prospect of CVD diamond thick film tool.
Low-pressure synthetic diamond : manufacturing and applications

C. Wild,B. Dischler

Abstract:Introduction CVD Diamond: A New and Promising Material Methods of CVD-Diamond Production Microwave-Plasma Deposition of Diamond Combustion Flame Deposition of Diamond Plasma-Jet Deposition of Diamond Hot-Filament Deposition of Diamond Low-Temperature Diamond Deposition Other CVD Methods for Diamond Production Heteroepitaxy and Highly Oriented Diamond Deposition Applications of CVD Diamond Thermal Properties and Applications of CVD Diamond CVD Diamond for Optical Windows CVD Diamond for X-Ray Windows and Lithography Mask Membranes CVD Diamond for Cutting Tools CVD Diamond Sensors for Temperature and Pressure CVD Diamond for Surface Acoustic Wave Filters Electron Emission from CVD-Diamond Cold Cathodes CVD Diamond for Ultraviolet and Particle Detectors Electronic Devices on CVD Diamond Outlook: CVD Diamond in the 21st Century.

Physics,Engineering,Materials Science
RECENT DEVELOPMENT IN DIAMOND SYNTHESIS

Changle Chen,Qianwang Chen

DOI: https://doi.org/10.1142/s0217979208038685

2008-01-01

Abstract:The high pressure-high temperature (HPHT) method led to wide applications of artificial diamonds in industry. Low temperature coating of diamonds has been studied for some time, and chemical vapor deposition has been developed. In this contribution, we will focus on the most recent developments in diamond synthesis, and especially the important progress upon hydrothermal synthesis and the reduction of carbide (HSRC), which has attracted more and more attention due to its great commercial potential. Especially, we will discuss the synthesis of colorless, large diamond crystals from the reduction of carbon dioxide or carbonates. In addition, some recent progress on the theoretical studies of the metastable nucleation and growth of diamonds will also be reviewed. Finally, theories about the genesis of natural diamond were briefly reviewed, and a new theory based on our experimental results was proposed, which suggests that diamond within the Earth could be produced from carbon dioxide wherever carbon dioxide existed and the conditions (e.g., temperature, pressure, and reducing environment) are satisfied.
Nano-crystalline Diamond Films Synthesized at Low Temperature and Low Pressure by Hot Filament Chemical Vapor Deposition

Tianliang Hao,Heng Zhang,Chengru Shi,Gaorong Han

DOI: https://doi.org/10.1016/j.surfcoat.2005.12.037

2006-01-01

Abstract:Nano-crystalline diamond (NCD) films on silicon were synthesized at a low temperature of 450–550 °C and a low pressure of ∼7 Torr by a hot filament chemical vapor deposition (HFCVD) in a mixture of CH4 and H2. The synthesis process included pretreatment, nucleation, growth and in situ annealing steps. The Si wafers were ultrasonically pretreated in a suspension of acetone and diamond powder (20–40 μm in diameter). It was found that the key parameter to obtain smooth NCD films by conventional HFCVD without Ar was the high nucleation density (ND). Optimal ultrasonic pretreatment with coarser diamond powder and nucleation at 2.5% CH4 greatly increased the ND to about 1.5×1011 cm−2. The NCD films with average grain sizes in the range of 40–70 nm, thickness less than 500 nm and surface roughness of ∼19 nm were grown at 1.5% CH4, 550 °C and 7 Torr, their optical transmittance in the near infrared (NIR) range was as high as 85%.
Effects of Carbon Concentration and Gas Pressure with Hydrogen-Rich Gas Chemistry on Synthesis and Characterizations of HFCVD Diamond Films on WC-Co Substrates

Hua Wang,Chengchuan Wang,Xinchang Wang,Fanghong Sun

DOI: https://doi.org/10.1016/j.surfcoat.2021.126839

IF: 4.865

2021-01-01

Surface and Coatings Technology

Abstract:The study concentrates on systematic investigations on the effects of extremely high or low carbon concentration (2%-14%) and gas pressure (800 Pa-3200 Pa) on crystal structures, grain sizes, phase compositions, surface and cross-sectional morphologies, growth rates, surface roughness, mechanical and tribological performances of various polycrystalline diamond films synthesized on cemented carbide (WC-Co) substrates with hydrogen-rich/ argon-lean gas mixture adopting hot filament chemical vapor deposition (HFCVD) method. The crystal structure, grain size and phase composition of various diamond films synthesized with different carbon concentration and gas pressure were analyzed, indicating that as-deposited diamond films cover microcrystalline diamond (MCD), submicrocrystalline diamond (SMCD), nanocrystalline diamond (NCD) and ultrananocrystalline diamond (UNCD). The surface and cross-sectional morphologies of these various polycrystalline diamond films were observed, and the growth rates of various diamond films were calculated. The three-dimensional morphologies and surface roughness were obtained. With increasing the carbon concentration and decreasing the gas pressure during the synthesis, the crystal size decreases so that diamond film with high smoothness, low surface roughness can be obtained. Subsequently, the synthesis mechanisms of MCD, SMCD, NCD and UNCD films with different carbon concentration and gas pressure under hydrogen-rich gas mixture adopting HFCVD were discussed in detail. The elastic modulus and nanohardness of different diamond films were measured quantitatively, and the film-substrate adhesion were evaluated qualitatively. Moreover, the tribological performances of various diamond films synthesized with different carbon concentration and gas pressure were studied by sliding against silicon nitride (Si3N4) ceramic balls. Results indicate that obtaining the dynamic equilibrium between sufficiently renucleation rate of diamond nuclei and effectively removal rate of non-diamond carbon phase by adjusting carbon and gas pressure under the hydrogen-rich gas chemistry can contribute to the synthesis of high-quality UNCD film.
Fracture Strength and Toughness of Chemical-Vapor-deposited Polycrystalline Diamond Films

Kang An,Liangxian Chen,Xiongbo Yan,Xin Jia,Jinlong Liu,Junjun Wei,Yuefei Zhang,Fanxiu Lu,Chengming Li

DOI: https://doi.org/10.1016/j.ceramint.2018.06.253

IF: 5.532

2018-01-01

Ceramics International

Abstract:The strength of diamond films prepared by chemical vapor deposition (CVD) is usually much lower than that of natural-type Ila single-crystal diamonds. In this work, the fracture strength of free-standing diamond films deposited by direct current arc plasma jet CVD has been examined by conducting three-point bending experiments. The results obtained for both the polished and as-grown samples were in good agreement with a well-known Hall-Petch equation describing the relationship between the fracture strength and grain size, indicating that grain refinement represented an effective way of improving the mechanical properties of CVD diamond films. Furthermore, the diversification of the crystalline texture of the films achieved by polishing apparently increased their fracture strength, which was inversely proportional to the film thickness. A theoretical method for estimating the fracture strength of free-standing CVD diamond films by approximating their intrinsic strength was proposed, whereas their fracture toughness was determined by conducting simplified four-point bending tests at room temperature, 25 degrees C, using a single-edge pre-cracked beam method.
Morphologies and structures of chemical vapor deposited diamond films and film-substrate interfaces

Tongchun Kuang,ZhengYi Liu,Kesong Zhou,DeZheng Wang,Mingjiang Dai

1998-01-01

Abstract:Polycrystalline diamond films were deposited on cemented carbide substrates using direct current plasma jet chemical vapor deposition (CVD) method. The structures, morphologies and compositions of diamond films and film-substrate interfaces have been characterized by XRD, Raman spectroscopy, SEM and EPMA. The results show that the faceted type diamond film with high crystallinity has good quality, high purity and excellent adhesion. Its film-substrate interface is dense and tortuous, and there is a significant mechanical anchoring effect between diamond film and substrate. The morphologies of substrate surfaces change greatly after deposition, there is several tens of microns in thickness cobalt-etched layer sequentially etched by plasma. The plasma etching leads to the cobalt-etched layer much rougher, which is beneficial to the diamond nucleation.
Chemical vapor deposited diamond with versatile grades: from gemstone to quantum electronics

Yuting Zheng,Chengming Li,Jinlong Liu,Junjun Wei,Xiaotong Zhang,Haitao Ye,Xiaoping Ouyang

DOI: https://doi.org/10.1007/s11706-022-0590-z

2022-03-01

Frontiers of Materials Science

Abstract:Chemical vapor deposited (CVD) diamond as a burgeoning multifunctional material with tailored quality and characteristics can be artificially synthesized and controlled for various applications. Correspondingly, the application-related "grade" concept associated with materials choice and design was gradually formulated, of which the availability and the performance are optimally suited. In this review, the explicit diversity of CVD diamond and the clarification of typical grades for applications, i.e., from resplendent gem-grade to promising quantum-grade, were systematically summarized and discussed, according to the crystal quality and main consideration of ubiquitous nitrogen impurity content as well as major applications. Realizations of those, from quantum-grade with near-ideal crystal to electronic-grade having extremely low imperfections and then to optical, thermal as well as mechanical-grade needing controlled flaws and allowable impurities, would competently fulfill the multi-field application prospects with appropriate choice in terms of cost and quality. Exceptionally, wide range defects and impurities in the gem-grade diamond (only indicating single crystal), which are detrimental for technology applications, endows CVD crystals with fancy colors to challenge their natural counterparts.

materials science, multidisciplinary
Chemical vapour deposition synthetic diamond: materials, technology and applications

R S Balmer,J R Brandon,S L Clewes,H K Dhillon,J M Dodson,I Friel,P N Inglis,T D Madgwick,M L Markham,T P Mollart,N Perkins,G A Scarsbrook,D J Twitchen,A J Whitehead,J J Wilman,S M Woollard

DOI: https://doi.org/10.48550/arXiv.0909.1185

2009-09-07

Materials Science

Abstract:Substantial developments have been achieved in the synthesis of chemical vapour deposition (CVD) diamond in recent years, providing engineers and designers with access to a large range of new diamond materials. CVD diamond has a number of outstanding material properties that can enable exceptional performance in applications as diverse as medical diagnostics, water treatment, radiation detection, high power electronics, consumer audio, magnetometry and novel lasers. Often the material is synthesized in planar form, however non-planar geometries are also possible and enable a number of key applications. This article reviews the material properties and characteristics of single crystal and polycrystalline CVD diamond, and how these can be utilized, focusing particularly on optics, electronics and electrochemistry. It also summarizes how CVD diamond can be tailored for specific applications, based on the ability to synthesize a consistent and engineered high performance product.
Polishing of CVD Diamond Films

ZN Guo,CY Wang,FL Zhang,TC Kuang

DOI: https://doi.org/10.4028/www.scientific.net/kem.202-203.165

2001-01-01

Key Engineering Materials

Abstract:A review of the update development for the polishing of CVD diamond films is presented. The discussion focuses mainly on the processing mechanism of different ways as well as their performances and behaviors. Examples of various processes are given to learn about the machinability of CVD diamond films, and a novel technology of polishing is put forward.
Low-Temperature Growth Of Ultra-Thin Nano-Crystalline Diamond Films By Hfcvd In A Ch4/H-2 Mixture

H Zhang,Tl Hao,Cr Shi,Gr Han

DOI: https://doi.org/10.3321/j.issn:1001-9014.2006.02.001

2006-01-01

JOURNAL OF INFRARED AND MILLIMETER WAVES

Abstract:The diamond nucleation and growth on Si substrate by hot filament chemical vapor deposition (HFCVD) at the low temperature ( similar to 550 degrees C) and low pressure ( similar to 7 Torr) were studied. Nucleation density (ND) as high as 1. 5 x 10(11) cm(-2) was obtained on well ultrasonically pretreated substrate at the nucleation conditions of 2.5% CH4/H-2. Diamond grain sizes change form sub-micron to nano-meter scales with the increase of CH4 concentration. Smooth ultra-thin ( thickness < 500 nm) nano-crystalline diamond (NCD) films with grain sizes less than 50 nm and surface roughness as low as 4 nm have been synthesized. The adhesion between the film and substrate is good. The optical absorption coefficient in visible ( VIS) to infrared (IR) wavelength range is less than 2 X 10(4) cm(-1). Smooth ultra-thin NCD films can be synthesized at low temperature and low pressure by our conventional HFCVD technique.
Developments in synthesis, characterization, and application of large, high-quality CVD single crystal diamond

Q. Liang,Y. F. Meng,C. -S. Yan,S. Krasnicki,J. Lai,K. Hemawan,H. Shu,D. Popov,T. Yu,W. Yang,H. K. Mao,R. J. Hemley

DOI: https://doi.org/10.3103/S1063457613040011

2013-01-01

Journal of Superhard Materials

Abstract:Single crystal diamond synthesis by microwave plasma chemical vapor deposition at rapid growth rate has considerably advanced in the past few years. Developments have been made in growth, optical quality, and mechanical properties. Of the various types of single crystal diamond that can be produced using these techniques, high quality single crystal CVD diamond can be routinely produced, and this material is playing an increasing role in research on materials under extreme conditions. This article highlights recent developments in single crystal CVD diamond synthesis and characterization, as well as various applications in high-pressure materials research.
Advances in deposition of diamond films on cemented carbide and progress of diamond coated cutting tools

Xianwen Liu,Hao Zhang,Guilin Lin,Zhaoguo Wang,Junliang Zhang,Hongyan Shi

DOI: https://doi.org/10.1016/j.vacuum.2023.112562

IF: 4

2023-09-02

Vacuum

Abstract:Diamond film is one of the significant coating materials for cutting tools due to the excellent properties in mechanics. However, cobalt on the surface of cemented carbide substrate is unfavorable to the nucleation and growth of diamond films, and the high residual stress also leads to the peeling of diamond films. Both two issues are the austere challenges in fabrication of diamond films on cemented carbide, which also have been attracting much attention from the increasing number of scholars and institutions. In this review, we focus on the recent advances in deposition of diamond films on cemented carbide, including pretreatment methods, deposition parameters, elements doping and insert of interlayers technology for removing cobalt, restraining cobalt diffusion, enhancing adhesion strength and surface properties, and reducing residual stress. Meanwhile, the progress of diamond coated cutting tools is reviewed, as well as the prospects regarding the deposition and applications of diamond films are discussed.

materials science, multidisciplinary,physics, applied
Thermodynamics of diamond film deposition at low pressure from chlorinated precursors

Z.-J. Liu,D.W. Zhang,Y.-Z. Wan,J.-Y. Zhang,J.-T. Wang

DOI: https://doi.org/10.1007/s003390050904

1999-01-01

Abstract:3 and C 2 H 2 concentrations at growth surface and accelerating abstraction of surface-terminating atoms. The effects of Cl addition on diamond film quality are also discussed.
Fabrication and Application of Smooth Composite Diamond Films

F. H. Sun,Z. M. Zhang,H. S. Shen,M. Chen

DOI: https://doi.org/10.1179/026708403225010145

IF: 2.451

2013-01-01

Surface Engineering

Abstract:Composite diamond films with smooth surfaces were deposited on the interior hole surface of Co cemented carbide drawing dies, using a mixture of acetone and hydrogen as source gases by bias enhanced hot filament chemical vapour deposition (CVD). A new process was used to reduce the surface roughness of diamond films by a composite diamond film C VD procedure, including first the deposition of the rough polycrystalline diamond layer and then the smooth, fine grained nanocrystalline diamond layer. The morphology, surface roughness and diamond purity were obtained by characterising the sample with SEM, X-ray diffraction (XRD), Raman spectroscopy and atomic force microscopy (AFM). The results show that smooth nanocrystalline diamond layers can be deposited on conventional microcrystalline diamond layers using a two step CVD process by regulating the deposition parameters. The Raman spectroscopy and XRD patterns of the composite film indicate the presence of nanocrystalline diamond. The surface roughness of the films was measured at R-a<100nm by AFM. These composite diamond films with multilayer (nanocrystalline/microcrystalline) structure have low surface roughness and high adhesive strength on WC-Co substrates. The diamond coated dies with these composite coatings display excellent performances in the practical application.
Investigation Of Technology Of Depositing Low Surface Roughness Diamond Thin Films On Cemented Carbides Inserts

M Chen,Fh Sun,Zm Zhang,Dj Hu

2000-01-01

Abstract:The surface roughness of CVD thin film diamond coated tools is the important factor which affects the tool cutting performances. In terms of improvement of CVD deposition technology, the new technical methods are proposed to lower the surface roughness of diamond thin films by appropriately increasing the carbon source concentration or controlling deposition pressure, and the effect of the new technology on the tool life and cutting performance is investigated. it is of great significance for practical application of the new technology of depositing diamond thin film with the low surface roughness and high adhesion strength on the cemented carbides substrates.
Thin Film Growth Conditions for Cvd Diamond under Low Pressure

JT Wang,ZJ Liu,DW Zhang,JY Zhang,YZ Wan

DOI: https://doi.org/10.1109/icsict.1998.786189

1998-01-01

Abstract:Non-equilibrium stationary phase diagrams for diamond growth with nitrogen addition into the reaction system were calculated and coordinate well with published experimental results. Therefore they can direct the experimental research on the subject. The effects of nitrogen addition on the deposition of diamond films were discussed by using the phase diagrams. The nitrogen addition can accelerate the deposition rate of diamond films in two aspects: enhance the CH/sub 3/ concentration at the growth surface and accelerate the abstraction of H atoms covering the growth surface sites.
A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates

A.P Malshe,B.S Park,W.D Brown,H.A Naseem

DOI: https://doi.org/10.1016/s0925-9635(99)00088-6

IF: 3.806

1999-07-01

Diamond and Related Materials

Abstract:State-of-the-art polycrystalline chemically vapor-deposited (CVD) diamond films and substrates have rough surfaces and non-uniform thicknesses which can adversely affect their application. Polishing and planarization can be used to remedy these drawbacks. In recent years, many polishing and planarization techniques have been reported, each having technological advantages and disadvantages. A specific polishing technique should be chosen based on these advantages and disadvantages, depending on the particular CVD diamond film application. Polishing and planarization techniques are reviewed in this paper. Parameters considered include polishing rate, surface finish requirements, and economic impact. To aid in the understanding and evaluation of diamond polishing techniques for applications, polishing mechanisms are also reviewed. Finally, CVD diamond applications and their surface roughness requirements are presented.

materials science, multidisciplinary,physics, applied, condensed matter, coatings & films
Ultrathin Diamond Nanofilms—Development, Challenges, and Applications

Stephan Handschuh‐Wang,Tao Wang,Yongbing Tang

DOI: https://doi.org/10.1002/smll.202007529

IF: 13.3

2021-05-26

Small

Abstract:Diamond is a highly attractive material for ample applications in material science, engineering, chemistry, and biology because of its favorable properties. The advent of conductive diamond coatings and the steady demand for miniaturization in a plethora of economic and scientific fields resulted in the impetus for interdisciplinary research to develop intricate deposition techniques for thin (≤1000 nm) and ultra-thin (≤100 nm) diamond films on non-diamond substrates. By virtue of the lowered thickness, diamond coatings feature high optical transparency in UV–IR range. Combined with their semi-conductivity and mechanical robustness, they are promising candidates for solar cells, optical devices, transparent electrodes, and photochemical applications. In this review, the difficulty of (ultra-thin) diamond film development and production, introduction of important stepping stones for thin diamond synthesis, and summarization of the main nucleation procedures for diamond film synthesis are elucidated. Thereafter, applications of thin diamond coatings are highlighted with a focus on applications relying on ultrathin diamond coatings, and the excellent properties of the diamond exploited in said applications are discussed, thus guiding the reader and enabling the reader to quickly get acquainted with the research field of ultrathin diamond coatings.

materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology
CVD diamond processing tools: A review

Zhenfei Guo,Bing Guo,Jufan Zhang,Guicheng Wu,Huan Zhao,Jianfei Jia,Qingyu Meng,Qingliang Zhao

DOI: https://doi.org/10.1016/j.jare.2024.09.013

IF: 12.822

2024-09-21

Journal of Advanced Research

Abstract:Highlights • A review of CVD diamond processing tools in manufacturing field is provided. • Applications of HFCVD and MPCVD in diamond growth are compared and summarized. • Introducing how to use coating, thick film and structuring to prepare CVD tools. • Applications of CVD diamond tools for cutting and grinding are concluded. • The challenges and future scope of CVD diamond processing tools are proposed. Background Since its development in the 1980 s, chemical vapor deposition (CVD) diamond has found wide application in addressing various engineering challenges, owing to its outstanding characteristics, including exceptionally high hardness, excellent thermal conductivity, and remarkable stability. Notably, processing tools utilizing CVD diamond as the working material exhibit substantial potential for application in the field of mechanical manufacturing. Serving as a viable substitute for natural diamond, CVD diamond processing tools not only offer advantages in production costs but also ensure processing performance on par with natural diamonds. This presents a valuable and effective approach for achieving advanced manufacturing with high precision and low production costs. Aim of Review The research progress of CVD diamond processing tools is comprehensively reviewed from four perspectives, encompassing the CVD process of diamonds, preparation methods, processing applications, and future development directions of CVD diamond processing tools. Key Scientific Concepts of Review The classification and exposition of CVD diamond deposition processes were presented. The fabrication of CVD diamond processing tools was elaborated. The machining applications of CVD diamond processing tools were then reviewed, mainly focusing on cutting and grinding processes, along with the tool wear characteristics. Finally, research challenges pertaining to CVD diamond processing tools were summarized, with insights proposed for future development opportunities and the anticipation of enhanced performance for prospective engineering applications. Graphical abstract Download: Download high-res image (305KB) Download: Download full-size image

multidisciplinary sciences

Synthesis and Application of CVD Diamond Films

Progress and Application Status of CVD Diamond Thick Film Coated Tools

Low-pressure synthetic diamond : manufacturing and applications

RECENT DEVELOPMENT IN DIAMOND SYNTHESIS

Nano-crystalline Diamond Films Synthesized at Low Temperature and Low Pressure by Hot Filament Chemical Vapor Deposition

Effects of Carbon Concentration and Gas Pressure with Hydrogen-Rich Gas Chemistry on Synthesis and Characterizations of HFCVD Diamond Films on WC-Co Substrates

Fracture Strength and Toughness of Chemical-Vapor-deposited Polycrystalline Diamond Films

Morphologies and structures of chemical vapor deposited diamond films and film-substrate interfaces

Chemical vapor deposited diamond with versatile grades: from gemstone to quantum electronics

Chemical vapour deposition synthetic diamond: materials, technology and applications

Polishing of CVD Diamond Films

Low-Temperature Growth Of Ultra-Thin Nano-Crystalline Diamond Films By Hfcvd In A Ch4/H-2 Mixture

Developments in synthesis, characterization, and application of large, high-quality CVD single crystal diamond

Advances in deposition of diamond films on cemented carbide and progress of diamond coated cutting tools

Thermodynamics of diamond film deposition at low pressure from chlorinated precursors

Fabrication and Application of Smooth Composite Diamond Films

Investigation Of Technology Of Depositing Low Surface Roughness Diamond Thin Films On Cemented Carbides Inserts

Thin Film Growth Conditions for Cvd Diamond under Low Pressure

A review of techniques for polishing and planarizing chemically vapor-deposited (CVD) diamond films and substrates

Ultrathin Diamond Nanofilms—Development, Challenges, and Applications

CVD diamond processing tools: A review