Abstract:Coherence tomography with extreme ultraviolet light (EUV) is applied to different van der Waals heterostructures, which enables a 3D sample reconstruction of encapsulated interfaces with nanoscopic axial resolution. This sets the basis for a new spectroscopy tool that, thanks to the temporal profile of laser‐driven EUV sources, can become an ideal probe of ultrafast processes occurring in opto‐electronic devices. New experimental methods with high out‐of‐plane spatial sensitivity combined with ultrafast temporal resolution can revolutionize the understanding of charge‐ and heat‐transfer dynamics occurring at interfaces. In this work, a step forward is taken in this direction by applying coherence tomography with extreme ultraviolet (EUV) light to different van der Waals heterostructures, which enables a 3D sample reconstruction with nanoscopic axial resolution. Furthermore, the measurements and, more in general, the approach is confirmed by ab initio calculations of the refractive index of layered materials that we compare to existing databases of empirical data. The EUV coherence tomography contrast is estimated in a broad spectral range (photon energy 65 –100 eV). This work sets the basis for the development of a new spectroscopy tool that, thanks to the temporal profile of EUV light sources and the high axial resolution of coherence tomography, can become the ideal probe of ultrafast processes occurring in van der Waals heterostructures and buried nanoscale opto‐electronic devices.

EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging.

Wavefront Sensing for Evaluation of Extreme Ultraviolet Microscopy

Special Issue "EUV and X-ray Wavefront Sensing"

Single-shot extreme-ultraviolet wavefront measurements of high-order harmonics.

Non-contact XUV metrology of Ru/B4C multilayer optics by means of Hartmann wavefront analysis

Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources

Optical Coherence Tomography of Van Der Waals Heterostructures Using Extreme Ultraviolet Light

Material-specific high-resolution table-top extreme ultraviolet microscopy

Simulation of X-ray Hartmann Wavefront Sensing with the Synchrotron Radiation Workshop

Hyperspectral wavefront sensing with a multicore fiber

Bright, polarization-tunable high repetition rate extreme ultraviolet beamline for coincidence electron-ion imaging

Lossless photon flux sensing methodology for EUV and Soft X-ray metrology systems

Comparison of wavefront sensing and ablation imprinting for FEL focus diagnostics at FLASH2

Continuously Red-Shift and Blue-Shift Wavelength-Tuneable, Narrowband, High Harmonics in the EUV - X-ray Regime for Resonance Imaging and Spectroscopies

Element-specific and high-bandwidth ferromagnetic resonance spectroscopy with a coherent, extreme ultraviolet (EUV) source

Measurements of ion fluxes in extreme ultraviolet-induced plasma of new EUV-beam-line 2 nanolithography research machine and their applications for optical component tests

Highly efficient and aberration-free off-plane grating spectrometer and monochromator for EUV—soft X-ray applications

Ultrafast Extreme Ultraviolet Photoemission Electron Microscope

Laser-based apparatus for extended ultraviolet femtosecond time-resolved photoemission spectroscopy

Generation of Spatially Coherent Light at Extreme Ultraviolet Wavelengths

Optical elements for the extreme ultraviolet and soft X-ray range