Nucleation, Coarsening, and Coalescence During Layer-by-layer Growth of Complex Oxides Via Pulsed Laser Deposition: Time-resolved, Diffuse X-ray Scattering Studies

J.D. Brock,J.D. Ferguson,Yongsam Kim,Hui-Qiong Wang,A.R. Woll
DOI: https://doi.org/10.1016/j.msea.2010.07.053
IF: 6.044
2010-01-01
Materials Science and Engineering A
Abstract:We review our real-time X-ray diffuse scattering studies of the evolving structure of complex oxide thin films during pulsed laser deposition in the layer-by-layer growth mode. These measurements provide detailed structural information on the time- and length-scales relevant for growth kinetics. Specifically, we measure both the in-plane length scale, L, and the characteristic relaxation time, τ, as a function of temperature to obtain the diffusivity, D. For both homo- and hetero-epitaxy, island nucleation under supersaturated conditions followed by coarsening of the island distribution, first via ripening and subsequently by coalescence, are identified as the key fundamental growth processes.
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