A Comprehensive Model for Ferroelectric FET Capturing the Key Behaviors: Scalability, Variation, Stochasticity, and Accumulation

Shan Deng,Guodong Yin,Wriddhi Chakraborty,Sourav Dutta,Suman Datta,Xueqing Li,Kai Ni
DOI: https://doi.org/10.1109/vlsitechnology18217.2020.9265014
2020-01-01
Abstract:In this work, we developed a comprehensive model for ferroelectric FET (FeFET), which can capture all the essential ferroelectric behaviors. Unlike previous models, which can describe only a subset but not all the reported ferroelectric behaviors, the proposed model can: i) predict device performance with geometry scaling; ii) quantify the device-to-device variation with device scaling; iii) exhibit stochasticity during a single domain switching; and iv) capture the accumulation of domain switching probability with applied pulse trains. This comprehensive model would enable researchers to explore a wide range of FeFET applications and guide device development, optimization and benchmarking.
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