Structural and Optical Properties of the Ultrathin 4 Nm TiO2/ITO Structure

Jianling Meng,Guibai Xie,Ying Liu,Shuntian Jia,Wenbin Cao,Yanqing Zhang
DOI: https://doi.org/10.1109/ogc50007.2020.9260454
2020-01-01
Abstract:Ultrathin TiO 2 deposited on ITO substrate plays an important role in the miniaturization of application devices. In this paper, 4 nm TiO 2 is deposited on ITO through atomic layer deposition (ALD) method. The amorphous TiO 2 is characterized by XPS, XRD, Raman and AFM. In addition, the dependence of transmittance spectra on the annealing temperature is measured to evaluate the thermal stability of the 4 nm TiO 2 /ITO structure. It is found that when the annealing temperature is increased to 300°C, 400°C and 500°C, the transmittance decreases in the visible light region due to the increased surface roughness while increases in the infrared region due to the ultrathin thickness of TiO 2 which can permit the atmospheric component reaching to the ITO layer.
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